Academic Journal
Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate
| Τίτλος: | Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate |
|---|---|
| Συγγραφείς: | Hansen, D. M.Aff1, Charters, D.Aff1, Au, Y. L.Aff1, Mak, W. K.Aff1, Tejasukmana, W.Aff1, Moran, P. D.Aff1, Kuech, T. F.Aff1 |
| Πηγή: | Journal of Electronic Materials. 29(11):1312-1318 |
| Βάση Δεδομένων: | Springer Nature Journals |
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