Academic Journal

Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate
Συγγραφείς: Hansen, D. M.Aff1, Charters, D.Aff1, Au, Y. L.Aff1, Mak, W. K.Aff1, Tejasukmana, W.Aff1, Moran, P. D.Aff1, Kuech, T. F.Aff1
Πηγή: Journal of Electronic Materials. 29(11):1312-1318
Βάση Δεδομένων: Springer Nature Journals
Περιγραφή
ISSN:03615235
1543186X
DOI:10.1007/s11664-000-0131-3