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Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate

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Τίτλος: Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate
Συγγραφείς: Hansen, D. M.Aff1, Charters, D.Aff1, Au, Y. L.Aff1, Mak, W. K.Aff1, Tejasukmana, W.Aff1, Moran, P. D.Aff1, Kuech, T. F.Aff1
Πηγή: Journal of Electronic Materials. 29(11):1312-1318
Βάση Δεδομένων: Springer Nature Journals
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  – Url: https://dx.doi.org/doi:10.1007/s11664-000-0131-3
    Name: EDS - Springer Nature Journals (s7799221)
    Category: fullText
    Text: View record at Springer
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PubType: Academic Journal
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PreciseRelevancyScore: 777.099609375
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  Data: Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate
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  Data: <i>Journal of Electronic Materials</i>. 29(11):1312-1318
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        Value: 10.1007/s11664-000-0131-3
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      – Text: English
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      – TitleFull: Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate
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            NameFull: Hansen, D. M.
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            NameFull: Charters, D.
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            NameFull: Au, Y. L.
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            NameFull: Mak, W. K.
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            NameFull: Tejasukmana, W.
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            NameFull: Moran, P. D.
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            – D: 01
              M: 11
              Type: published
              Y: 2000
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              Value: 29
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              Value: 11
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            – TitleFull: Journal of Electronic Materials
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