Hansen, D. M., Charters, D., Au, Y. L., Mak, W. K., Tejasukmana, W., Moran, P. D., & Kuech, T. F. (2000). Mechanistic study of borosilicate glass growth by low-pressure chemical vapor deposition from tetraethylorthosilicate and trimethylborate. Journal of Electronic Materials, 29(11), 1312. https://doi.org/10.1007/s11664-000-0131-3
Παραπομπή σε μορφή Chicago (17η εκδ.)Hansen, D. M., D. Charters, Y. L. Au, W. K. Mak, W. Tejasukmana, P. D. Moran, και T. F. Kuech. "Mechanistic Study of Borosilicate Glass Growth by Low-pressure Chemical Vapor Deposition from Tetraethylorthosilicate and Trimethylborate." Journal of Electronic Materials 29, no. 11 (2000): 1312. https://doi.org/10.1007/s11664-000-0131-3.
Παραπομπή σε μορφή MLA (9th εκδ.)Hansen, D. M., et al. "Mechanistic Study of Borosilicate Glass Growth by Low-pressure Chemical Vapor Deposition from Tetraethylorthosilicate and Trimethylborate." Journal of Electronic Materials, vol. 29, no. 11, 2000, p. 1312, https://doi.org/10.1007/s11664-000-0131-3.