Engineering gap fill, microstructure and film composition of electroplated copper for on-chip metallization

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Engineering gap fill, microstructure and film composition of electroplated copper for on-chip metallization
Συγγραφείς: Dubin, V.M., Thomas, C.D., Baxter, N., Block, C., Chikarmane, V., McGregor, P., Jentz, D., Hong, K., Hearne, S., Zhi, C., Zierath, D., Miner, B., Kuhn, M., Budrevich, A., Simka, H., Shankar, S.
Πηγή: Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461) Interconnect technology conference Interconnect Technology Conference, 2001. Proceedings of the IEEE 2001 International. :271-273 2001
Relation: Proceedings of the IEEE 2001 International Interconnect Technology Conference
Βάση Δεδομένων: IEEE Xplore Digital Library
Περιγραφή
ISBN:0780366786
9780780366787
DOI:10.1109/IITC.2001.930081