Interfacial adhesion of copper-low k interconnects

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Interfacial adhesion of copper-low k interconnects
Συγγραφείς: Andideh, E., Scherban, T., Sun, B., Blaine, J., Block, C., Jin, B.
Πηγή: Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461) Interconnect technology conference Interconnect Technology Conference, 2001. Proceedings of the IEEE 2001 International. :257-259 2001
Relation: Proceedings of the IEEE 2001 International Interconnect Technology Conference
Βάση Δεδομένων: IEEE Xplore Digital Library
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