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Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs

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Title: Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs
Authors: Maheshwari, O., Mohapatra, N.R.
Source: IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 39(3):410-416 Aug, 2026
Database: IEEE Xplore Digital Library
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  Data: IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 39(3):410-416 Aug, 2026
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        Value: 10.1109/TSM.2026.3701836
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