Academic Journal
Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs
| Title: | Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs |
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| Authors: | Maheshwari, O., Mohapatra, N.R. |
| Source: | IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 39(3):410-416 Aug, 2026 |
| Database: | IEEE Xplore Digital Library |
| ISSN: | 08946507 15582345 |
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| DOI: | 10.1109/TSM.2026.3701836 |