Maheshwari, O., & Mohapatra, N. (2026). Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs. IEEE Transactions on Semiconductor Manufacturing, Semiconductor Manufacturing, IEEE Transactions on, IEEE Trans. Semicond. Manufact., 39(3), 410-416. https://doi.org/10.1109/TSM.2026.3701836
Παραπομπή σε μορφή Chicago (17η εκδ.)Maheshwari, O., και N.R Mohapatra. "Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs." IEEE Transactions on Semiconductor Manufacturing, Semiconductor Manufacturing, IEEE Transactions on, IEEE Trans. Semicond. Manufact. 39, no. 3 (2026): 410-416. https://doi.org/10.1109/TSM.2026.3701836.
Παραπομπή σε μορφή MLA (9th εκδ.)Maheshwari, O., και N.R Mohapatra. "Unified Machine Learning Framework for Process–Device–Circuit Variability Quantification of Inner Spacer Etch in GAA FETs." IEEE Transactions on Semiconductor Manufacturing, Semiconductor Manufacturing, IEEE Transactions on, IEEE Trans. Semicond. Manufact., vol. 39, no. 3, 2026, pp. 410-416, https://doi.org/10.1109/TSM.2026.3701836.