Conference
Optimizing Niobium-Oxide Film Deposition via Pulsed-DC Sputtering by Dual-Stage Deep Neural Network-Gaussian Process Regression Framework
| Τίτλος: | Optimizing Niobium-Oxide Film Deposition via Pulsed-DC Sputtering by Dual-Stage Deep Neural Network-Gaussian Process Regression Framework |
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| Συγγραφείς: | Yang, Gaoqi, Tan, Jiajun, Zhu, Qingyun, Liang, Ling, Bao, Lin, Wang, Zongwei, Cai, Yimao |
| Πηγή: | 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2026 10th IEEE. :1-3 Mar, 2026 |
| Relation: | 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) |
| Βάση Δεδομένων: | IEEE Xplore Digital Library |
| FullText | Text: Availability: 0 |
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| Header | DbId: edseee DbLabel: IEEE Xplore Digital Library An: edseee.11497950 RelevancyScore: 1132 AccessLevel: 2 PubType: Conference PubTypeId: conference PreciseRelevancyScore: 1132.33544921875 |
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| Items | – Name: Title Label: Title Group: Ti Data: Optimizing Niobium-Oxide Film Deposition via Pulsed-DC Sputtering by Dual-Stage Deep Neural Network-Gaussian Process Regression Framework – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Yang%2C+Gaoqi%22">Yang, Gaoqi</searchLink><br /><searchLink fieldCode="AR" term="%22Tan%2C+Jiajun%22">Tan, Jiajun</searchLink><br /><searchLink fieldCode="AR" term="%22Zhu%2C+Qingyun%22">Zhu, Qingyun</searchLink><br /><searchLink fieldCode="AR" term="%22Liang%2C+Ling%22">Liang, Ling</searchLink><br /><searchLink fieldCode="AR" term="%22Bao%2C+Lin%22">Bao, Lin</searchLink><br /><searchLink fieldCode="AR" term="%22Wang%2C+Zongwei%22">Wang, Zongwei</searchLink><br /><searchLink fieldCode="AR" term="%22Cai%2C+Yimao%22">Cai, Yimao</searchLink> – Name: TitleSource Label: Source Group: Src Data: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2026 10th IEEE. :1-3 Mar, 2026 – Name: NoteTitleSource Label: Relation Group: SrcInfo Data: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=edseee&AN=edseee.11497950 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1109/EDTM65772.2026.11497950 PhysicalDescription: Pagination: PageCount: 3 StartPage: 1 Titles: – TitleFull: Optimizing Niobium-Oxide Film Deposition via Pulsed-DC Sputtering by Dual-Stage Deep Neural Network-Gaussian Process Regression Framework Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Yang, Gaoqi – PersonEntity: Name: NameFull: Tan, Jiajun – PersonEntity: Name: NameFull: Zhu, Qingyun – PersonEntity: Name: NameFull: Liang, Ling – PersonEntity: Name: NameFull: Bao, Lin – PersonEntity: Name: NameFull: Wang, Zongwei – PersonEntity: Name: NameFull: Cai, Yimao IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 03 Type: published Y: 2026 Identifiers: – Type: isbn-print Value: 9798331585983 – Type: isbn-print Value: 9798331585990 – Type: issn-locals Value: edseee.IEEEConferenc Titles: – TitleFull: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), Electron Devices Technology & Manufacturing Conference (EDTM), 2026 10th IEEE Type: main |
| ResultId | 1 |