Optimizing Niobium-Oxide Film Deposition via Pulsed-DC Sputtering by Dual-Stage Deep Neural Network-Gaussian Process Regression Framework

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Optimizing Niobium-Oxide Film Deposition via Pulsed-DC Sputtering by Dual-Stage Deep Neural Network-Gaussian Process Regression Framework
Συγγραφείς: Yang, Gaoqi, Tan, Jiajun, Zhu, Qingyun, Liang, Ling, Bao, Lin, Wang, Zongwei, Cai, Yimao
Πηγή: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2026 10th IEEE. :1-3 Mar, 2026
Relation: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
Βάση Δεδομένων: IEEE Xplore Digital Library
Περιγραφή
ISBN:9798331585983
9798331585990
DOI:10.1109/EDTM65772.2026.11497950