Conference
Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation
| Τίτλος: | Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation |
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| Συγγραφείς: | Magklaras, Aris, Alefragis, Panayiotis, Gogos, Christos, Birbas, Alexios |
| Πηγή: | 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM) Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), 2025 10th South-East Europe. :1-6 Sep, 2025 |
| Relation: | 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM) |
| Βάση Δεδομένων: | IEEE Xplore Digital Library |
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