Conference
Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation
| Title: | Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation |
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| Authors: | Magklaras, Aris, Alefragis, Panayiotis, Gogos, Christos, Birbas, Alexios |
| Source: | 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM) Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), 2025 10th South-East Europe. :1-6 Sep, 2025 |
| Relation: | 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM) |
| Database: | IEEE Xplore Digital Library |
| ISBN: | 9798331571023 9798331571030 |
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| DOI: | 10.1109/SEEDA-CECNSM68644.2025.11329737 |