Magklaras, A., Alefragis, P., Gogos, C., & Birbas, A. (2025). Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation. 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), 2025 10th South-East Europe, 1. https://doi.org/10.1109/SEEDA-CECNSM68644.2025.11329737
Παραπομπή σε μορφή Chicago (17η εκδ.)Magklaras, Aris, Panayiotis Alefragis, Christos Gogos, και Alexios Birbas. "Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation." 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), 2025 10th South-East Europe 2025: 1. https://doi.org/10.1109/SEEDA-CECNSM68644.2025.11329737.
Παραπομπή σε μορφή MLA (9th εκδ.)Magklaras, Aris, et al. "Photolithography Overlay Errors Simulation Using Zernike Based Aberration Modeling and Intra-Field Variation." 2025 10th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), Design Automation, Computer Engineering, Computer Networks and Social Media Conference (SEEDA-CECNSM), 2025 10th South-East Europe, 2025, p. 1, https://doi.org/10.1109/SEEDA-CECNSM68644.2025.11329737.