Low-Temperature NiSi Formation via Microwave Annealing for Stable Metal-Induced Lateral Crystallization in 3D NAND Flash Memory

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Low-Temperature NiSi Formation via Microwave Annealing for Stable Metal-Induced Lateral Crystallization in 3D NAND Flash Memory
Συγγραφείς: Kwon, Ohhyuk, Lee, Sunhyeong, Seo, Jongseon, Han, Geonhui, Kim, Dongmin, Park, Sejun, Lee, Junyoung, Park, Kwangmin, Yang, Siyoung, Choi, HanMei, Lee, Woosung, Hwang, Hyunsang
Πηγή: 2025 Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) VLSI Technology and Circuits (VLSI Technology and Circuits), 2025 Symposium on. :1-3 Jun, 2025
Relation: 2025 Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
Βάση Δεδομένων: IEEE Xplore Digital Library
Περιγραφή
ISBN:9784863488151
ISSN:21589682
DOI:10.23919/VLSITechnologyandCir65189.2025.11075197