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Electron beam-based metrology after CMOS.

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Electron beam-based metrology after CMOS.
Συγγραφείς: Liddle JA; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA., Hoskins BD; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA., Vladár AE; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA., Villarrubia JS; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.
Πηγή: APL materials [APL Mater] 2018; Vol. 6.
Τύπος έκδοσης: Journal Article
Γλώσσα: English
Στοιχεία περιοδικού: Publisher: AIP Publishing LLC Country of Publication: United States NLM ID: 101645742 Publication Model: Print Cited Medium: Print ISSN: 2166-532X (Print) Linking ISSN: 2166532X NLM ISO Abbreviation: APL Mater Subsets: PubMed not MEDLINE
Imprint Name(s): Original Publication: Melville, NY : AIP Publishing LLC, 2013-
Περίληψη: The magnitudes of the challenges facing electron-based metrology for post-CMOS technology are reviewed. Directed selfassembly, nanophotonics/plasmonics, and resistive switches and selectors, are examined as exemplars of important post-CMOS technologies. Materials, devices, and architectures emerging from these technologies pose new metrology requirements: defect detection, possibly subsurface, in soft materials, accurate measurement of size, shape, and roughness of structures for nanophotonic devices, contamination-free measurement of surface-sensitive structures, and identification of subtle structural, chemical, or electronic changes of state associated with switching in non-volatile memory elements. Electron-beam techniques are examined in the light of these emerging requirements. The strong electron-matter interaction provides measurable signal from small sample features, rendering electron-beam methods more suitable than most for nanometer-scale metrology, but as is to be expected, solutions to many of the measurement challenges are yet to be demonstrated. The seeds of possible solutions are identified when they are available.
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Grant Information: 9999-NIST United States ImNIST Intramural NIST DOC
Entry Date(s): Date Created: 20190416 Latest Revision: 20261008
Update Code: 20261008
PubMed Central ID: PMC6459207
DOI: 10.1063/1.5038249
PMID: 30984475
Βάση Δεδομένων: MEDLINE
Περιγραφή
ISSN:2166-532X
DOI:10.1063/1.5038249