Park, S., Ma, J., Oh, S., & Kim, W. (2026). Reducing External Light Interference in OST HMDs via Perceptual-Metric-Guided Pattern Design. IEEE Photonics Technology Letters, Photonics Technology Letters, IEEE, IEEE Photon. Technol. Lett., 38(22), 1869-1871. https://doi.org/10.1109/LPT.2026.3729674
Παραπομπή σε μορφή Chicago (17η εκδ.)Park, S.G, J.S Ma, S. Oh, και W. Kim. "Reducing External Light Interference in OST HMDs via Perceptual-Metric-Guided Pattern Design." IEEE Photonics Technology Letters, Photonics Technology Letters, IEEE, IEEE Photon. Technol. Lett. 38, no. 22 (2026): 1869-1871. https://doi.org/10.1109/LPT.2026.3729674.
Παραπομπή σε μορφή MLA (9th εκδ.)Park, S.G, et al. "Reducing External Light Interference in OST HMDs via Perceptual-Metric-Guided Pattern Design." IEEE Photonics Technology Letters, Photonics Technology Letters, IEEE, IEEE Photon. Technol. Lett., vol. 38, no. 22, 2026, pp. 1869-1871, https://doi.org/10.1109/LPT.2026.3729674.