High-k scaling for reliability enhancement in 300-mm-integrated WS2 FETs

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: High-k scaling for reliability enhancement in 300-mm-integrated WS2 FETs
Συγγραφείς: Panarella, Luca, Tyaginov, Stanislav, Smets, Quentin, Kaczer, Ben, Schram, Tom, Cott, Daire, De La Rosa, Cesar Javier Lockhart, Sankar Kar, Gouri, Afanas'Ev, Valeri
Πηγή: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2026 10th IEEE. :1-3 Mar, 2026
Relation: 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
Βάση Δεδομένων: IEEE Xplore Digital Library