Academic Journal

Modeling of Doped Fully Depleted Behavior Induced by Total Ionizing Dose in Voltage Reference Circuits From a 65-nm Partially Depleted SOI Technology

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Modeling of Doped Fully Depleted Behavior Induced by Total Ionizing Dose in Voltage Reference Circuits From a 65-nm Partially Depleted SOI Technology
Συγγραφείς: Lomonaco, J., Rostand, N., Martinie, S., Charbonnier, G., Marcandella, C., Bedecarrats, T., Bournel, A.
Πηγή: IEEE Transactions on Nuclear Science IEEE Trans. Nucl. Sci. Nuclear Science, IEEE Transactions on. 72(4):1276-1284 Apr, 2025
Βάση Δεδομένων: IEEE Xplore Digital Library
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  Data: IEEE Transactions on Nuclear Science IEEE Trans. Nucl. Sci. Nuclear Science, IEEE Transactions on. 72(4):1276-1284 Apr, 2025
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        Value: 10.1109/TNS.2025.3531687
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