Academic Journal

Evidence of Improved Thermal Stability via Nanoscale Contact Engineering in IGZO Source-Gated Thin-Film Transistors

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Evidence of Improved Thermal Stability via Nanoscale Contact Engineering in IGZO Source-Gated Thin-Film Transistors
Συγγραφείς: Alfarisyi, S., Golec, P., Bestelink, E., Niang, K.M., Flewitt, A.J., Silva, S.R.P., Sporea, R.A.
Πηγή: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(7):3582-3589 Jul, 2023
Βάση Δεδομένων: IEEE Xplore Digital Library
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PubType: Academic Journal
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  Data: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(7):3582-3589 Jul, 2023
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1109/TED.2023.3276337
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        PageCount: 8
        StartPage: 3582
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      – TitleFull: Evidence of Improved Thermal Stability via Nanoscale Contact Engineering in IGZO Source-Gated Thin-Film Transistors
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            NameFull: Golec, P.
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            NameFull: Bestelink, E.
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            NameFull: Niang, K.M.
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            NameFull: Flewitt, A.J.
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            NameFull: Silva, S.R.P.
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            NameFull: Sporea, R.A.
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              M: 07
              Type: published
              Y: 2023
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