Wang, X., & Kwong, D. (2005). A novel high-K SONOS type non-volatile memory and NMOS HfO₂ Vth instability studies for gate electrode and interface threatment effects.
Παραπομπή σε μορφή Chicago (17η εκδ.)Wang, Xuguang, και Dim-Lee Kwong. A Novel High-K SONOS Type Non-volatile Memory and NMOS HfO₂ Vth Instability Studies for Gate Electrode and Interface Threatment Effects. 2005.
Παραπομπή σε μορφή MLA (9th εκδ.)Wang, Xuguang, και Dim-Lee Kwong. A Novel High-K SONOS Type Non-volatile Memory and NMOS HfO₂ Vth Instability Studies for Gate Electrode and Interface Threatment Effects. 2005.
Πρόσοχή: Οι παραπομπές μπορεί να μην είναι 100% ακριβείς.