Academic Journal
High-temperature memristors enabled by interfacial engineering.
| Τίτλος: | High-temperature memristors enabled by interfacial engineering. |
|---|---|
| Συγγραφείς: | Zhao, Jian, Jorgensen, Cameron S., Mahalingam, Krishnamurthy, Bowers, Cynthia, Sugimoto, Wataru, Ito, Kai, Kim, Seung Ju, Zhao, Ruoyu, Xu, Yichun, Liao, Han-Ting, Kalia, Rajiv K., Nakano, Aiichiro, Shimamura, Kohei, Shimojo, Fuyuki, Vashishta, Priya, Roy, Ajit K., Ge, Ning, Hu, Miao, Williams, R. Stanley, Xia, Qiangfei |
| Πηγή: | Science; 5/14/2026, Vol. 392 Issue 6799, p771-779, 9p |
| Θεματικοί όροι: | Memristors, High temperature electronics, Surfaces (Technology), Tungsten, Nonvolatile memory, Thermal stability, Hafnium oxide, Graphene |
| Περίληψη: | Nonvolatile memories (NVMs) that operate reliably at high temperatures are essential for electronics in extreme environments. Here, we report graphene (Gra)/HfO |
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| Βάση Δεδομένων: | Complementary Index |
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