Academic Journal
Unmasking the Resolution-Throughput Tradespace of Focused-Ion-Beam Machining.
| Τίτλος: | Unmasking the Resolution-Throughput Tradespace of Focused-Ion-Beam Machining. |
|---|---|
| Συγγραφείς: | Madison AC; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Villarrubia JS; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Liao KT; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; Maryland Nanocenter, College Park, MD 20740, USA., Copeland CR; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Schumacher J; CNST NanoFab, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Siebein K; CNST NanoFab, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Ilic BR; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; CNST NanoFab, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Liddle JA; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Stavis SM; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. |
| Πηγή: | Advanced functional materials [Adv Funct Mater] 2022 Sep; Vol. 32 (38). |
| Τύπος έκδοσης: | Journal Article |
| Γλώσσα: | English |
| Στοιχεία περιοδικού: | Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 101190390 Publication Model: Print Cited Medium: Print ISSN: 1616-301X (Print) Linking ISSN: 1616301X NLM ISO Abbreviation: Adv Funct Mater Subsets: PubMed not MEDLINE |
| Imprint Name(s): | Original Publication: Weinheim, Germany : Wiley-VCH, c2001- |
| Περίληψη: | Focused-ion-beam machining is a powerful process to fabricate complex nanostructures, often through a sacrificial mask that enables milling beyond the resolution limit of the ion beam. However, current understanding of this super-resolution effect is empirical in the spatial domain and nonexistent in the temporal domain. This article reports the primary study of this fundamental tradespace of resolution and throughput. Chromia functions well as a masking material due to its smooth, uniform, and amorphous structure. An efficient method of in-line metrology enables characterization of ion-beam focus by scanning electron microscopy. Fabrication and characterization of complex test structures through chromia and into silica probe the response of the bilayer to a focused beam of gallium cations, demonstrating super-resolution factors of up to 6 ± 2 and improvements to volume throughput of at least factors of 42 ± 2, with uncertainties denoting 95% coverage intervals. Tractable theory models the essential aspects of the super-resolution effect for various nanostructures. Application of the new tradespace increases the volume throughput of machining Fresnel lenses by a factor of 75, enabling the introduction of projection standards for optical microscopy. These results enable paradigm shifts of sacrificial masking from empirical to engineering design and from prototyping to manufacturing. |
| Competing Interests: | Conflict of Interest The authors declare no conflict of interest. |
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| Grant Information: | 9999-NIST United States ImNIST Intramural NIST DOC |
| Contributed Indexing: | Keywords: chromium oxide; focused ion beam; sacrificial masking; super-resolution |
| Entry Date(s): | Date Created: 20230224 Latest Revision: 20250530 |
| Update Code: | 20260130 |
| PubMed Central ID: | PMC9945459 |
| DOI: | 10.1002/adfm.202111840 |
| PMID: | 36824209 |
| Βάση Δεδομένων: | MEDLINE |
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