Academic Journal
Rapid Prototyping of Nanofluidic Slits in a Silicone Bilayer.
| Τίτλος: | Rapid Prototyping of Nanofluidic Slits in a Silicone Bilayer. |
|---|---|
| Συγγραφείς: | Kole TP; National Institute of Standards and Technology, Gaithersburg, MD 20899; MedStar Georgetown University Hospital, Department of Radiation Medicine, Washington, DC 20007., Liao KT; National Institute of Standards and Technology, Gaithersburg, MD 20899; University of Maryland, Maryland Nanocenter, College Park, MD 20740., Schiffels D; National Institute of Standards and Technology, Gaithersburg, MD 20899; University of Maryland, Maryland Nanocenter, College Park, MD 20740., Ilic BR; National Institute of Standards and Technology, Gaithersburg, MD 20899., Strychalski EA; National Institute of Standards and Technology, Gaithersburg, MD 20899., Kralj JG; National Institute of Standards and Technology, Gaithersburg, MD 20899., Liddle JA; National Institute of Standards and Technology, Gaithersburg, MD 20899., Dritschilo A; MedStar Georgetown University Hospital, Department of Radiation Medicine, Washington, DC 20007., Stavis SM; National Institute of Standards and Technology, Gaithersburg, MD 20899. |
| Πηγή: | Journal of research of the National Institute of Standards and Technology [J Res Natl Inst Stand Technol] 2015 Nov 17; Vol. 120, pp. 252-69. Date of Electronic Publication: 2015 Nov 17 (Print Publication: 2015). |
| Τύπος έκδοσης: | Journal Article |
| Γλώσσα: | English |
| Στοιχεία περιοδικού: | Publisher: U.S. Dept. of Commerce, National Institute of Standards and Technology Country of Publication: United States NLM ID: 8912688 Publication Model: eCollection Cited Medium: Print ISSN: 1044-677X (Print) Linking ISSN: 1044677X NLM ISO Abbreviation: J Res Natl Inst Stand Technol Subsets: PubMed not MEDLINE |
| Imprint Name(s): | Original Publication: [Gaithersburg, MD] : [Washington : U.S. Dept. of Commerce, National Institute of Standards and Technology ; U.S. G.P.O., distributor, 1988- |
| Περίληψη: | This article reports a process for rapidly prototyping nanofluidic devices, particularly those comprising slits with microscale widths and nanoscale depths, in silicone. This process consists of designing a nanofluidic device, fabricating a photomask, fabricating a device mold in epoxy photoresist, molding a device in silicone, cutting and punching a molded silicone device, bonding a silicone device to a glass substrate, and filling the device with aqueous solution. By using a bilayer of hard and soft silicone, we have formed and filled nanofluidic slits with depths of less than 400 nm and aspect ratios of width to depth exceeding 250 without collapse of the slits. An important attribute of this article is that the description of this rapid prototyping process is very comprehensive, presenting context and details which are highly relevant to the rational implementation and reliable repetition of the process. Moreover, this process makes use of equipment commonly found in nanofabrication facilities and research laboratories, facilitating the broad adaptation and application of the process. Therefore, while this article specifically informs users of the Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST), we anticipate that this information will be generally useful for the nanofabrication and nanofluidics research communities at large, and particularly useful for neophyte nanofabricators and nanofluidicists. |
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| Contributed Indexing: | Keywords: DNA; SU-8; device; microfluidic; molding; nanofluidic; nanoparticle; prototyping; replica; silicon; silicone |
| Entry Date(s): | Date Created: 20160310 Date Completed: 20160309 Latest Revision: 20181113 |
| Update Code: | 20260130 |
| PubMed Central ID: | PMC4730671 |
| DOI: | 10.6028/jres.120.015 |
| PMID: | 26958449 |
| Βάση Δεδομένων: | MEDLINE |
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