Academic Journal

Advances in Optimization Strategies of Multicomponent Amorphous Oxide Semiconductors for Thin‐Film Transistors.

Λεπτομέρειες βιβλιογραφικής εγγραφής
Τίτλος: Advances in Optimization Strategies of Multicomponent Amorphous Oxide Semiconductors for Thin‐Film Transistors.
Συγγραφείς: Chen, Yuyun1,2 (AUTHOR), Xu, Guodong1,2 (AUTHOR), Chen, Yuanming1,2 (AUTHOR), Wu, Weijing3 (AUTHOR), Yao, Ruohe3 (AUTHOR), Shen, Yi1,2 (AUTHOR) yishen@goworld-lcd.com
Πηγή: Physica Status Solidi. A: Applications & Materials Science. 10/6/2026, Vol. 223 Issue 19, p1-14. 14p.
Θεματικοί όροι: *Thin film transistors, *Bilayers (Solid state physics), *Charge carrier mobility, *Amorphous semiconductors
Περίληψη: This paper systematically summarizes the recent advances in modifying multicomponent amorphous oxide semiconductors (AOS) to enhance the overall performance of thin‐film transistors (TFTs), focusing primarily on field‐effect mobility and operational stability against bias and illumination stress. Two mainstream strategies—single‐layer modification and bilayer structure design—were reviewed. The mechanisms of these strategies for influencing TFT characteristics were discussed in detail by examining unmodified versus modified single‐layer oxides and single‐layer versus bilayer oxides under consistent fabrication and testing conditions. This comparative approach minimizes cross‐study deviations. Finally, the applicable scenarios for AOS TFTs were clarified by evaluating the current status of performance (with an emphasis on mobility and negative bias illumination stress stability) achieved through those two modification approaches. [ABSTRACT FROM AUTHOR]
Βάση Δεδομένων: Academic Search Index
Περιγραφή
ISSN:18626300
DOI:10.1002/pssa.70527