Roniboss, A., Malathy, D., Boopathy, G., Choi, D., & Jeevitha, T. U. (2026). Thermal Design of a Schiff Base Cobalt(II) Precursor: Thermal Stability, Volatility, and Thin Film Deposition of Nanocrystalline Co3O4 by Plasma‐Assisted MOCVD. Applied Organometallic Chemistry, 40(7), 1. https://doi.org/10.1002/aoc.70601
Παραπομπή σε μορφή Chicago (17η εκδ.)Roniboss, A., D. Malathy, G. Boopathy, Dongjin Choi, και T. U. Jeevitha. "Thermal Design of a Schiff Base Cobalt(II) Precursor: Thermal Stability, Volatility, and Thin Film Deposition of Nanocrystalline Co3O4 by Plasma‐Assisted MOCVD." Applied Organometallic Chemistry 40, no. 7 (2026): 1. https://doi.org/10.1002/aoc.70601.
Παραπομπή σε μορφή MLA (9th εκδ.)Roniboss, A., et al. "Thermal Design of a Schiff Base Cobalt(II) Precursor: Thermal Stability, Volatility, and Thin Film Deposition of Nanocrystalline Co3O4 by Plasma‐Assisted MOCVD." Applied Organometallic Chemistry, vol. 40, no. 7, 2026, p. 1, https://doi.org/10.1002/aoc.70601.