Automatic speed control system for the chemical etching of thin films

Authors: A.V. Dalekorej, V.P. Ivanytsky, A.A. Kryuchyn, Ya.P. Legeta, V.V. Petrov, V.M. Rubish, M.M. Ryaboshchuk, I.I. Chychura

Source: Фізика і хімія твердого тіла, Vol 26, Iss 1, Pp 91-99 (2025)

Subject Terms: automation of chemical etching processes, automatic control system, interference thickness control methods, etching process control algorithm, Physics, QC1-999

File Description: electronic resource

Relation: https://journals.pnu.edu.ua/index.php/pcss/article/view/8778; https://doaj.org/toc/1729-4428; https://doaj.org/toc/2309-8589

Access URL: https://doaj.org/article/11ebda1d7b854bdaa3801d6349877357