Roadmap on emerging hardware and technology for machine learning

Authors: Berggren, K, Xia, Q, Likharev, KK, Strukov, DB, Jiang, H, Mikolajick, T, Querlioz, D, Salinga, M, Erickson, JR, Pi, S, Xiong, F, Lin, P, Li, C, Chen, Y, Xiong, S, Hoskins, BD, Daniels, MW, Madhavan, A, Liddle, JA, McClelland, JJ, Yang, Y, Rupp, J, Nonnenmann, SS, Cheng, KT, Gong, N, Lastras-Montaño, MA, Talin, AA, Salleo, A, Shastri, BJ, de Lima, TF, Prucnal, P, Tait, AN, Shen, Y, Meng, H, Roques-Carmes, C, Cheng, Z, Bhaskaran, H, Jariwala, D, Wang, H, Shainline, JM, Segall, K, Yang, JJ, Roy, K, Datta, S, Raychowdhury, A

Subject Terms: artificial intelligence, machine learning, neural network models, neuromorphic computing, hardware technologies

Relation: Nanotechnology; Nanotechnology, 2020, v. 32 n. 1, p. article no. 012002; article no. 012002; 320857; WOS:000579646000001; https://hub.hku.hk/handle/10722/295356; 32

Availability: https://hub.hku.hk/handle/10722/295356
https://doi.org/10.1088/1361-6528/aba70f

Contamination of the food chain by polychlorinated biphenyls from a broken transformer.

Authors: Drotman DP, Baxter PJ, Liddle JA

Source: American Journal of Public Health; Mar1983, Vol. 73 Issue 3, p290-292, 3p

Subject Terms: Eggs, Chickens, Americans, Polychlorinated biphenyls

Geographic Terms: United States

Processing issues in top-down approaches to quantum computer development in silicon

Authors: Park, SJ, Persaud, A, Liddle, JA, Nilsson, J, Bokor, J, Schneider, DH, Rangelow, IW, Schenkel, T, Park, SJ

Index Terms: quantum computer, qubit, ion implantation, electron-beam lithography, cond-mat, Applied Physics, Condensed Matter Physics, Other Physical Sciences, Electrical and Electronic Engineering, publication

URL: https://escholarship.org/uc/item/76v2q9xf
https://escholarship.org/

Complex cooperativity in DNA origami revealed via design-dependent defectivity.

Authors: Majikes JM; Theiss Research, La Jolla, CA 92037, United States.; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, United States., Hasni A; Biomedical Engineering, Johns Hopkins University, Baltimore, MD 21211,United States., Haridas S; University of Maryland, College Park, MD 20742, United States., Robertson JWF; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, United States., Pintar AL; Statistical Engineering Division, National Institute of Standards and Technology, Gaithersburg, MD 92037, United States., Zwolak M; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, United States., Liddle JA; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, United States.

Source: Nucleic acids research [Nucleic Acids Res] 2026 Feb 05; Vol. 54 (4).

Publication Type: Journal Article

Journal Info: Publisher: Oxford University Press Country of Publication: England NLM ID: 0411011 Publication Model: Print Cited Medium: Internet ISSN: 1362-4962 (Electronic) Linking ISSN: 03051048 NLM ISO Abbreviation: Nucleic Acids Res Subsets: MEDLINE

MeSH Terms: DNA Nanostructures*/chemistry , DNA*/chemistry, Nucleic Acid Conformation ; Thermodynamics

Variable gain DNA nanostructure charge amplifiers for biosensing.

Authors: Majikes JM; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. arvind.balijepalli@nist.gov., Cho S; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. arvind.balijepalli@nist.gov., Cleveland TE 4th; Biomolecular Measurement Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; Institute for Bioscience and Biotechnology Research, University of Maryland, Rockville, MD 20850, USA., Liddle JA; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. arvind.balijepalli@nist.gov., Balijepalli A; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA. arvind.balijepalli@nist.gov.

Source: Nanoscale [Nanoscale] 2024 Nov 21; Vol. 16 (45), pp. 20893-20902. Date of Electronic Publication: 2024 Nov 21.

Publication Type: Journal Article

Journal Info: Publisher: RSC Pub Country of Publication: England NLM ID: 101525249 Publication Model: Electronic Cited Medium: Internet ISSN: 2040-3372 (Electronic) Linking ISSN: 20403364 NLM ISO Abbreviation: Nanoscale Subsets: MEDLINE

MeSH Terms: DNA*/chemistry , Nanostructures*/chemistry , Biosensing Techniques*, Nucleic Acid Hybridization ; Nucleic Acid Conformation ; Static Electricity ; Electrochemical Techniques

DNA-PAINT Probe Modifications Support High-Resolution Imaging with Shorter Binding Domains.

Authors: Piantanida L; Micron School of Materials Science & Engineering, Boise State University, Boise, Idaho 83725, United States., Dickinson GD; Micron School of Materials Science & Engineering, Boise State University, Boise, Idaho 83725, United States., Majikes JM; National Institute of Standards and Technology, Gaithersburg, Maryland 20878, United States., Clay W; Micron School of Materials Science & Engineering, Boise State University, Boise, Idaho 83725, United States., Liddle JA; National Institute of Standards and Technology, Gaithersburg, Maryland 20878, United States., Andersen T; Department of Computer Science, Boise State University, Boise, Idaho 83725, United States., Hayden EJ; Micron School of Materials Science & Engineering, Boise State University, Boise, Idaho 83725, United States.; Department of Biological Sciences, Boise State University, Boise, Idaho 83725, United States., Kuang W; Department of Electrical & Computer Engineering, Boise State University, Boise, Idaho 83725, United States., Hughes WL; Micron School of Materials Science & Engineering, Boise State University, Boise, Idaho 83725, United States.

Source: ACS nano [ACS Nano] 2024 Aug 20; Vol. 18 (33), pp. 22369-22377. Date of Electronic Publication: 2024 Aug 07.

Publication Type: Journal Article; Research Support, Non-U.S. Gov't

Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE

MeSH Terms: DNA*/chemistry, DNA Probes/chemistry ; Nanostructures/chemistry ; Nucleic Acid Hybridization

DNA nanostructure decoration: a how-to tutorial.

Authors: Piantanida L; Faculty of Applied Science, School of Engineering, University of British Columbia, Kelowna, B.C., V1V 1V7, Canada., Liddle JA; National Institute of Standards and Technology, Gaithersburg, MD, 20878, United States of America., Hughes WL; Faculty of Applied Science, School of Engineering, University of British Columbia, Kelowna, B.C., V1V 1V7, Canada., Majikes JM; National Institute of Standards and Technology, Gaithersburg, MD, 20878, United States of America.

Source: Nanotechnology [Nanotechnology] 2024 Apr 23; Vol. 35 (27). Date of Electronic Publication: 2024 Apr 23.

Publication Type: Journal Article; Review

Journal Info: Publisher: IOP Pub Country of Publication: England NLM ID: 101241272 Publication Model: Electronic Cited Medium: Internet ISSN: 1361-6528 (Electronic) Linking ISSN: 09574484 NLM ISO Abbreviation: Nanotechnology Subsets: MEDLINE

MeSH Terms: DNA*/chemistry , Nanostructures*/chemistry , Nanotechnology*/methods, Quantum Dots/chemistry ; Metal Nanoparticles/chemistry

Binding, brightness, or noise? Extracting temperature-dependent properties of dye bound to DNA.

Authors: DeJaco RF; Applied and Computational Mathematics Division, National Institute of Standards and Technology, Gaithersburg, Maryland; Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland. Electronic address: robert.dejaco@nist.gov., Majikes JM; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, Maryland., Liddle JA; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, Maryland., Kearsley AJ; Applied and Computational Mathematics Division, National Institute of Standards and Technology, Gaithersburg, Maryland.

Source: Biophysical journal [Biophys J] 2023 Apr 04; Vol. 122 (7), pp. 1364-1375. Date of Electronic Publication: 2023 Mar 04.

Publication Type: Journal Article; Research Support, Non-U.S. Gov't

Journal Info: Publisher: Cell Press Country of Publication: United States NLM ID: 0370626 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1542-0086 (Electronic) Linking ISSN: 00063495 NLM ISO Abbreviation: Biophys J Subsets: MEDLINE

MeSH Terms: DNA*/chemistry , DNA, Single-Stranded*, Fluorescent Dyes/chemistry ; Temperature ; Organic Chemicals

Synthesizing the biochemical and semiconductor worlds: the future of nucleic acid nanotechnology.

Authors: Majikes JM; Physical Measurement Laboratory, National Institute Standards and Technology, 100 Bureau drive, Gaithersburg, MD, 20878, USA. Liddle@nist.gov., Liddle JA; Physical Measurement Laboratory, National Institute Standards and Technology, 100 Bureau drive, Gaithersburg, MD, 20878, USA. Liddle@nist.gov.

Source: Nanoscale [Nanoscale] 2022 Nov 03; Vol. 14 (42), pp. 15586-15595. Date of Electronic Publication: 2022 Nov 03.

Publication Type: Journal Article; Review

Journal Info: Publisher: RSC Pub Country of Publication: England NLM ID: 101525249 Publication Model: Electronic Cited Medium: Internet ISSN: 2040-3372 (Electronic) Linking ISSN: 20403364 NLM ISO Abbreviation: Nanoscale Subsets: MEDLINE

MeSH Terms: Nucleic Acids*, Nanotechnology ; Semiconductors

Unmasking the Resolution-Throughput Tradespace of Focused-Ion-Beam Machining.

Authors: Madison AC; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Villarrubia JS; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Liao KT; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; Maryland Nanocenter, College Park, MD 20740, USA., Copeland CR; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Schumacher J; CNST NanoFab, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Siebein K; CNST NanoFab, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Ilic BR; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.; CNST NanoFab, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Liddle JA; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Stavis SM; Microsystems and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.

Source: Advanced functional materials [Adv Funct Mater] 2022 Sep; Vol. 32 (38).

Publication Type: Journal Article

Journal Info: Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 101190390 Publication Model: Print Cited Medium: Print ISSN: 1616-301X (Print) Linking ISSN: 1616301X NLM ISO Abbreviation: Adv Funct Mater Subsets: PubMed not MEDLINE

Best practice for improved accuracy: A critical reassessment of van't Hoff analysis of melt curves.

Authors: Majikes JM; Microsystem and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, Maryland. Electronic address: jacob.majikes@nist.gov., Zwolak M; Microsystem and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, Maryland., Liddle JA; Microsystem and Nanotechnology Division, National Institute of Standards and Technology, Gaithersburg, Maryland. Electronic address: liddle@nist.gov.

Source: Biophysical journal [Biophys J] 2022 Jun 07; Vol. 121 (11), pp. 1986-2001. Date of Electronic Publication: 2022 May 10.

Publication Type: Journal Article

Journal Info: Publisher: Cell Press Country of Publication: United States NLM ID: 0370626 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1542-0086 (Electronic) Linking ISSN: 00063495 NLM ISO Abbreviation: Biophys J Subsets: MEDLINE

MeSH Terms: Thermodynamics*

Failure Mechanisms in DNA Self-Assembly: Barriers to Single-Fold Yield.

Authors: Majikes JM; National Institute of Standards and Technology, Gaithersburg, Maryland 20899-6203, United States., Patrone PN; National Institute of Standards and Technology, Gaithersburg, Maryland 20899-6203, United States., Kearsley AJ; National Institute of Standards and Technology, Gaithersburg, Maryland 20899-6203, United States., Zwolak M; National Institute of Standards and Technology, Gaithersburg, Maryland 20899-6203, United States., Liddle JA; National Institute of Standards and Technology, Gaithersburg, Maryland 20899-6203, United States.

Source: ACS nano [ACS Nano] 2021 Feb 23; Vol. 15 (2), pp. 3284-3294. Date of Electronic Publication: 2021 Feb 10.

Publication Type: Journal Article

Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE

MeSH Terms: DNA* , Nanostructures*, Nanotechnology ; Nucleic Acid Conformation

DNA Origami Design: A How-To Tutorial.

Authors: Majikes JM; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA., Liddle JA; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.

Source: Journal of research of the National Institute of Standards and Technology [J Res Natl Inst Stand Technol] 2021 Jan 08; Vol. 126, pp. 126001. Date of Electronic Publication: 2021 Jan 08 (Print Publication: 2021).

Publication Type: Journal Article

Journal Info: Publisher: U.S. Dept. of Commerce, National Institute of Standards and Technology Country of Publication: United States NLM ID: 8912688 Publication Model: eCollection Cited Medium: Print ISSN: 1044-677X (Print) Linking ISSN: 1044677X NLM ISO Abbreviation: J Res Natl Inst Stand Technol Subsets: PubMed not MEDLINE

Analysis and uncertainty quantification of DNA fluorescence melt data: Applications of affine transformations.

Authors: Patrone PN; National Institute of Standards and Technology, USA. Electronic address: paul.patrone@nist.gov., Kearsley AJ; National Institute of Standards and Technology, USA., Majikes JM; National Institute of Standards and Technology, USA., Liddle JA; National Institute of Standards and Technology, USA.

Source: Analytical biochemistry [Anal Biochem] 2020 Oct 15; Vol. 607, pp. 113773. Date of Electronic Publication: 2020 Jun 08.

Publication Type: Journal Article; Research Support, Non-U.S. Gov't

Journal Info: Publisher: Elsevier Country of Publication: United States NLM ID: 0370535 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1096-0309 (Electronic) Linking ISSN: 00032697 NLM ISO Abbreviation: Anal Biochem Subsets: MEDLINE

MeSH Terms: DNA/*analysis, Databases, Factual ; Fluorescence Resonance Energy Transfer ; Models, Molecular ; Nucleic Acid Conformation ; Reproducibility of Results ; Spectrometry, Fluorescence ; Thermodynamics ; Transition Temperature

Revealing thermodynamics of DNA origami folding via affine transformations.

Authors: Majikes JM; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA., Patrone PN; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA., Schiffels D; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA., Zwolak M; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA., Kearsley AJ; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA., Forry SP; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA., Liddle JA; National Institute of Standards and Technology, Gaithersburg, MD 20899-6203, USA.

Source: Nucleic acids research [Nucleic Acids Res] 2020 Jun 04; Vol. 48 (10), pp. 5268-5280.

Publication Type: Journal Article

Journal Info: Publisher: Oxford University Press Country of Publication: England NLM ID: 0411011 Publication Model: Print Cited Medium: Internet ISSN: 1362-4962 (Electronic) Linking ISSN: 03051048 NLM ISO Abbreviation: Nucleic Acids Res Subsets: MEDLINE

MeSH Terms: Thermodynamics*, DNA/*chemistry, Nanostructures/chemistry ; Calorimetry, Differential Scanning ; Entropy ; Fluorescence Resonance Energy Transfer ; Fluorescent Dyes ; Nucleic Acid Conformation ; Nucleic Acid Denaturation

So, You Want to Have a Nanofab? Shared-Use Nanofabrication and Characterization Facilities: Cost-of-Ownership, Toolset, Utilization, and Lessons Learned.

Authors: Liddle JA; National Institute of Standards and Technology,Gaithersburg, MD 20899, USA., Bowser J; National Institute of Standards and Technology,Gaithersburg, MD 20899, USA., Ilic BR; National Institute of Standards and Technology,Gaithersburg, MD 20899, USA., Luciani V; National Institute of Standards and Technology,Gaithersburg, MD 20899, USA.

Source: Journal of research of the National Institute of Standards and Technology [J Res Natl Inst Stand Technol] 2020 Feb 21; Vol. 125, pp. 125009. Date of Electronic Publication: 2020 Feb 21 (Print Publication: 2020).

Publication Type: Journal Article

Journal Info: Publisher: U.S. Dept. of Commerce, National Institute of Standards and Technology Country of Publication: United States NLM ID: 8912688 Publication Model: eCollection Cited Medium: Print ISSN: 1044-677X (Print) Linking ISSN: 1044677X NLM ISO Abbreviation: J Res Natl Inst Stand Technol Subsets: PubMed not MEDLINE

Aligned carbon nanotube morphogenesis predicts physical properties of their polymer nanocomposites.

Authors: Natarajan B; Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA and Corporate Strategic Research, ExxonMobil Research and Engineering, Annandale, NJ 08801, USA., Stein IY; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. wardle@mit.edu and Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA., Lachman N; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. wardle@mit.edu and Department of Materials Science and Engineering, Tel Aviv University, Tel Aviv 6997801, Israel., Yamamoto N; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. wardle@mit.edu and Department of Aerospace Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA., Jacobs DS; Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA., Sharma R; Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA. james.liddle@nist.gov., Liddle JA; Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA. james.liddle@nist.gov., Wardle BL; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. wardle@mit.edu.

Source: Nanoscale [Nanoscale] 2019 Sep 21; Vol. 11 (35), pp. 16327-16335. Date of Electronic Publication: 2019 Jun 24.

Publication Type: Journal Article

Journal Info: Publisher: RSC Pub Country of Publication: England NLM ID: 101525249 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2040-3372 (Electronic) Linking ISSN: 20403364 NLM ISO Abbreviation: Nanoscale Subsets: MEDLINE; PubMed not MEDLINE

Low-Temperature Growth of Carbon Nanotubes Catalyzed by Sodium-Based Ingredients.

Authors: Li R; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Antunes EF; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Kalfon-Cohen E; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Kudo A; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Acauan L; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Yang WD; Center for Nanoscale Science and Technology, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, MD, 20899, USA., Wang C; Center for Nanoscale Science and Technology, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, MD, 20899, USA., Cui K; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Liotta AH; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA., Rajan AG; Department of Chemical Engineering, Massachusetts Institute of Technology, 25 Ames St, Cambridge, MA, 02142, USA., Gardener J; Center for Nanoscale Systems, Harvard University, 11 Oxford St, Cambridge, MA, 02138, USA., Bell DC; Center for Nanoscale Systems, Harvard University, 11 Oxford St, Cambridge, MA, 02138, USA., Strano MS; Department of Chemical Engineering, Massachusetts Institute of Technology, 25 Ames St, Cambridge, MA, 02142, USA., Liddle JA; Center for Nanoscale Science and Technology, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, MD, 20899, USA., Sharma R; Center for Nanoscale Science and Technology, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, MD, 20899, USA., Wardle BL; Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Bldg. 33-220, Cambridge, MA, 02139, USA.

Source: Angewandte Chemie (International ed. in English) [Angew Chem Int Ed Engl] 2019 Jul 01; Vol. 58 (27), pp. 9204-9209. Date of Electronic Publication: 2019 May 27.

Publication Type: Journal Article

Journal Info: Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 0370543 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-3773 (Electronic) Linking ISSN: 14337851 NLM ISO Abbreviation: Angew Chem Int Ed Engl Subsets: PubMed not MEDLINE

Subnanometer localization accuracy in widefield optical microscopy.

Authors: Copeland CR; 1Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.; 2Maryland NanoCenter, University of Maryland, College Park, MD 20742 USA., Geist J; 3Engineering Physics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA., McGray CD; 3Engineering Physics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA., Aksyuk VA; 1Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA., Liddle JA; 1Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA., Ilic BR; 1Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA., Stavis SM; 1Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.

Source: Light, science & applications [Light Sci Appl] 2018 Jul 11; Vol. 7, pp. 31. Date of Electronic Publication: 2018 Jul 11 (Print Publication: 2018).

Publication Type: Journal Article

Journal Info: Publisher: Springer Nature Country of Publication: England NLM ID: 101610753 Publication Model: eCollection Cited Medium: Internet ISSN: 2047-7538 (Electronic) Linking ISSN: 20477538 NLM ISO Abbreviation: Light Sci Appl Subsets: PubMed not MEDLINE

Electron beam-based metrology after CMOS.

Authors: Liddle JA; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA., Hoskins BD; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA., Vladár AE; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA., Villarrubia JS; National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.

Source: APL materials [APL Mater] 2018; Vol. 6.

Publication Type: Journal Article

Journal Info: Publisher: AIP Publishing LLC Country of Publication: United States NLM ID: 101645742 Publication Model: Print Cited Medium: Print ISSN: 2166-532X (Print) Linking ISSN: 2166532X NLM ISO Abbreviation: APL Mater Subsets: PubMed not MEDLINE