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    Academic Journal

    Contributors: National Key Research and Development Program (China), Hiroshima University, University of Tokyo, Diputación Foral de Guipúzcoa, Ministerio de Ciencia, Innovación y Universidades (España), Agencia Estatal de Investigación (España), German Research Foundation, Saint Petersburg State University, Russian Science Foundation, Consejo Superior de Investigaciones Científicas [https://ror.org/02gfc7t72]

    Source: Digital.CSIC. Repositorio Institucional del CSIC
    instname
    Consejo Superior de Investigaciones Científicas (CSIC)
    The Journal of Physical Chemistry C
    The Journal of Physical Chemistry C. 2021. Vol. 125, № 3. P. 1784-1792

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    Academic Journal
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    Academic Journal

    Source: Sensor Electronics and Microsystem Technologies; Том 14, № 1 (2017); 21-30
    Сенсорная электроника и микросистемные технологии; Том 14, № 1 (2017); 21-30
    Сенсорна електроніка і мікросистемні технології; Том 14, № 1 (2017); 21-30

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    Academic Journal

    Source: Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering; Том 22, № 3 (2019); 202-211 ; Известия высших учебных заведений. Материалы электронной техники; Том 22, № 3 (2019); 202-211 ; 2413-6387 ; 1609-3577 ; 10.17073/1609-3577-2019-3

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    Relation: https://met.misis.ru/jour/article/view/379/311; Chevtchenko S. A., Reshchikov M. A., Fan Q., Ni X., Moon Y. T., Baski A. A., Morkoç H. Study of SiNх and SiO2 passivation of GaN surfaces // J. Appl. Phys. 2007. V. 101, N 11. P. 2740324. DOI:10.1063/1.2740324; Mizue C., Hori Y., Miczek M., Hashizume T. Capacitance-voltage characteristics of Al2O3/AlGaN/GaN structures and state density distribution at Al2O3/AlGaN Interface // Jpn. J. Appl. Phys. 2011. V. 50, N 2R. P. 021001. DOI:10.1143/JJAP.50.021001; Matys M., Stoklas R., Blaho M., Adamowicz B. Origin of positive fixed charge at insulator/AlGaN interfaces and its control by AlGaN composition // J. Appl. Phys. 2017. V. 110, N 24. P. 243505. DOI:10.1063/1.4986482; Geng K., Chen D., Zhou Q., Wang H. AlGaN/GaN MIS-HEMT with PECVD SiNx, SiON, SiO2 as gate dielectric and passivation layer // Electronics. 2018. V. 7, N 12. p. 416. DOI:10.3390/electronics7120416; Matys M., Adamowicz B., Domanowska A., Michalewicz A., Stoklas R., Akazawa M., Yatabe Z., Hashizume T. On the origin of interface states at oxide/III-nitride heterojunction interfaces // J. Appl. Phys. 2016. V. 120, Iss. 22. P. 225305. DOI:10.1063/1.4971409; Shengyin Xie, Jiayun Yin, Sen Zhang, Bo Liu, Wei Zhou, Zhihong Feng. Trap behaviors in AlGaN–GaN heterostructures by C–V characterization // Solid-State Electronics. 2009. V. 53, Iss. 11. P. 1183—1185. DOI:10.1016/j.sse.2009.08.006; Зубков В. И. Диагностика гетероструктур с квантовыми ямами InxGa1-xAs/GaAs методом вольт-фарадных характеристик: разрывы зон, уровни квантования, волновые функции // Физика и техника полупроводников. 2007. Т. 41, № 3. С. 331—337. URL: https://journals.ioffe.ru/articles/viewPDF/6276; Miczek M., Mizue C., Hashizume T., Adamowicz B. Effects of interface states and temperature on the C-V behavior of metal/insulator/AlGaN/GaN heterostructure capacitors // J. Appl. Phys. 2008. V. 103, Iss. 10. P. 104510. DOI:10.1063/1.2924334; Arulkumaran S., Egawa T., Ishikawa H., Jimbo T. Characterization of different –Al-content AlxGa1-xN/GaN heterostructures and high-electron-mobility transistors on sapphire // J. Vacuum Science & Techology B. 2003. V. 21, Iss. 2. P. 888—894. DOI:10.1116/1.1556398; Hashizume T., Hasegawa H. Effects of nitrogen deficiency on electronic properties of AlGaN surfaces subjected to thermal and plasma processes // Applied Surface Science. 2004. V. 234, Iss. 1–4. P. 387—394. DOI:10.1016/j.apsusc.2004.05.091; Dinara S. M., Jana S. Kr., Ghosh S., Mukhopadhyay P., Kumar R., Chakraborty A., Bhattacharya S., Biswas D. Enhancement of two dimensional electron gas concentrations due to Si3N4 passivation on Al0.3Ga0.7N/GaN heterostructure: strain and interface capacitance analysis // AIP Advances. 2015. V. 5, Iss. 4. P. 047136. DOI:10.1063/1.4919098; Sameer J. J. Surface and mechanical stress effects in AlGaN/GaN high electron mobility transistors: Thesis: Ph. D. Massachusetts Institute of Technology, Department of Materials Science and Engineering, 2017. 161 p. URL: https://dspace.mit.edu/handle/1721.1/111325; Mosca R., Gombia E., Passaseo A., Tasco V., Peroni M., Romanini P. DLTS characterization of silicon nitride passivated AlGaN/GaN heterostructures // Superlattices and Microstructures. 2004. V. 36, Iss. 4–6. P. 425—433. DOI:10.1016/j.spmi.2004.09.006; Hori Y., Mizue C., Hashizume T. Process conditions for improvement of electrical properties of Al2O3/n-GaN structures prepared by atomic layer deposition // Jpn. J. Appl. Phys. 2010. V. 49, N 8R. P. 080201. DOI:10.1143/JJAP.49.080201; Hashizume T., Alekseev E., Pavlidis D., Boutros K. S., Redwing J. Capacitance-voltage characterization of AlN/GaN metal-insulator-semiconductor structures grown on sapphire substrate by metalorganic chemical vapor deposition // J. Appl. Phys. 2000. V. 88, Iss. 4. P. 1983—1986. DOI:10.1063/1.1303722; Eller B. S., Yang J., Nemanich R. J. Electronic surface and dielectric interface states on GaN and AlGaN // J. Vacuum Science & Technology A. 2013. V. 31, Iss. 5. P. 050807. DOI:10.1116/1.4807904; Dusza J., Steen M. Microhardness load/size effect in individual grains of a gas pressure sintered silicon nitride // J. Amer. Ceramic Society. 1998. V. 81, N 11. P. 3022—3024.; Яковлева Н. И., Никонов А. В., Болтарь К. О., Седнев М. В. Анализ механизмов темновых токов матриц ультрафиолетовых фотодиодов на основе гетероструктур AlGaN // Успехи прикладной физики. 2018. Т. 6, № 1. С. 44—55.; Monroe D. Hopping exponential band tails // Phys. Rev. Lett. 1985. V. 54, Iss. 2. P. 146—149. DOI:10.1103/PhysRevLett.54.146; Бочкарева Н. И., Вороненков В. В., Горбунов Р. И., Вирко М. В., Коготков В. С., Леонидов А. А., Воронцов-Велья­ми­нов П. Н., Шеремет И. А., Шретер Ю. Г. Прыжковая проводимость и диэлектрическая релаксация в барьерах Шоттки на основе GaN // Физика и техника полупроводников. 2017. T. 51, № 9. С. 1235—1242. DOI:10.21883/FTP.2017.09.44888.8528; https://met.misis.ru/jour/article/view/379

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    Academic Journal

    Contributors: Michetti, Armelle, Laboratoire de Physique des Solides (LPS), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Catalan Institute of Nanoscience and Nanotechnology = Institut Català de Nanociència i Nanotecnologia (ICN2), Universitat Autònoma de Barcelona = Autonomous University of Barcelona = Universidad Autónoma de Barcelona (UAB)-Consejo Superior de Investigaciones Cientificas España = Spanish National Research Council Spain (CSIC)-Barcelona Institute of Science and Technology (BIST), Interactions modulables dans des états quantiques 2D (NEEL - Quan2m), Institut Néel (NEEL), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes 2016-2019 (UGA 2016-2019 )-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes 2016-2019 (UGA 2016-2019 ), Elettra Sincrotrone Trieste, Institute of Electronic Materials Technology, 01-919 Warsaw, Poland, Laboratoire des Solides Irradiés - Irradiated Solids Laboratory (LSI), Institut Rayonnement Matière de Saclay (DRF) (IRAMIS), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-École polytechnique (X), Institut Polytechnique de Paris (IP Paris)-Institut Polytechnique de Paris (IP Paris)-Centre National de la Recherche Scientifique (CNRS), City University of New York New York (CUNY), Laboratorio Nazionale TASC (CNR-INFM), Istituto Nazionale per la Fisica della Materia, CNR Istituto Officina dei Materiali (IOM), National Research Council of Italy, ANR-10-LABX-0039,PALM,Physics: Atoms, Light, Matter(2010)

    Source: Dipòsit Digital de Documents de la UAB
    Universitat Autònoma de Barcelona
    Nano letters
    16 (2016): 3409–3414. doi:10.1021/acs.nanolett.5b02635
    info:cnr-pdr/source/autori:Caputo, Marco; Panighel, Mirko; Lisi, Simone; Khalil, Lama; Di Santo, Giovanni; Papalazarou, Evangelos; Hruban, Andrzej; Konczykowski, Marcin; Krusin-Elbaum, Lia; Aliev, Ziya S.; Babanly, Mahammad B.; Otrokov, Mikhail M.; Politano, Antonio; Chulkov, Evgueni V.; Arnau, Andres; Marinova, Vera; Das, Pranab K.; Fujii, Jun; Vobornik, Ivana; Perfetti, Luca; Mugarza, Aitor; Goldoni, Andrea; Marsi, Marino/titolo:Manipulating the Topological Interface by Molecular Adsorbates: Adsorption of Co-Phthalocyanine on Bi2Se3/doi:10.1021%2Facs.nanolett.5b02635/rivista:Nano letters (Print)/anno:2016/pagina_da:3409/pagina_a:3414/intervallo_pagine:3409–3414/volume:16
    Nano letters. 2016. Vol. 16, № 6. P. 3409-3414

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    Academic Journal

    Source: ACS nano 10 (2016): 3518–3524. doi:10.1021/acsnano.5b07750
    info:cnr-pdr/source/autori:Papagno M.; Eremeev S.V.; Fujii J.; Aliev Z.S.; Babanly M.B.; Mahatha S.K.; Vobornik I.; Mamedov N.T.; Pacile D.; Chulkov E.V./titolo:Multiple Coexisting Dirac Surface States in Three-Dimensional Topological Insulator PbBi6Te10/doi:10.1021%2Facsnano.5b07750/rivista:ACS nano/anno:2016/pagina_da:3518/pagina_a:3524/intervallo_pagine:3518–3524/volume:10
    ACS Nano. 2016. Vol. 10, № 3. P. 3518-3524

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    Academic Journal

    Source: Сенсорна електроніка і мікросистемні технології; Том 17, № 3 (2020); 4-11
    Сенсорная электроника и микросистемные технологии; Том 17, № 3 (2020); 4-11
    Sensor Electronics and Microsystem Technologies; Том 17, № 3 (2020); 4-11

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  20. 20
    Conference

    Contributors: Отроков, М. М.

    Relation: Перспективы развития фундаментальных наук : сборник научных трудов XV Международной конференции студентов, аспирантов и молодых ученых, г. Томск, 24-27 апреля 2018 г. Т. 1 : Физика. — Томск, 2018.; http://earchive.tpu.ru/handle/11683/50907