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    Academic Journal

    Contributors: The work was supported by the Belarusian National Research Program “Materials Science, New Materials and Technologies”., Работа поддержана Государственной программой научных исследований «Материаловедение, новые материалы и технологии» Республики Беларусь.

    Source: Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series; Том 60, № 2 (2024); 153-161 ; Известия Национальной академии наук Беларуси. Серия физико-математических наук; Том 60, № 2 (2024); 153-161 ; 2524-2415 ; 1561-2430 ; 10.29235/1561-2430-2024-60-2

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    Relation: https://vestifm.belnauka.by/jour/article/view/782/603; Физика гидрогенизированного аморфного кремния: пер. с англ. / под ред. Дж. Джоунопулоса, Дж. Люковски. – Вып. 1. – М.: Мир, 1987. – 368 с.; Физика гидрогенизированного аморфного кремния: пер. с англ. / под ред. Дж. Джоунопулоса, Дж. Люковски. – Вып. 2. – М.: Мир, 1988. – 448 с.; Электропроводность и структура слоев аморфного кремния / А. А. Андреев [и др.] // Физика и техника полупроводников. – 1986. – Т. 20, вып. 8. – С. 1469–1475.; Technology and applications of amorphous silicon / ed. by R. A. Street. – Berlin: Springer, 2000. – xii + 418 p. https://doi.org/10.1007/978-3-662-04141-3; Springer handbook of semiconductor devices / eds.: M. Rudan, R. Brunetti, S. Reggiani. – Cham: Springer, 2023. – xxiv + 1680 p. https://doi.org/10.1007/978-3-030-79827-7; Radscheit, H. Ac and Dc conductivity in amorphous silicon-hydrogen films / H. Radscheit, K. G. Breitschwerdt // Solid State Commun. – 1983. – Vol. 47, № 3. – P. 157–161. https://doi.org/10.1016/0038-1098(83)90699-3; Djurić, Z. Static characteristics of the metal–insulator–semiconductor–insulator–metal (MISIM) structure–II. Low frequency capacitance / Z. Djurić, M. Smiljanić, D. Tjapkin // Solid-State Electron. – 1975. – Vol. 18, № 10. – P. 827–831. https://doi.org/10.1016/0038-1101(75)90002-7; Poklonski, N. A. High-Frequency Capacitor with Working Substance “Insulator-Undoped Silicon-Insulator” / N. A. Poklonski, I. I. Anikeev, S. A. Vyrko // Приборы и методы измерений. – 2022. – Т. 13, № 4. – С. 247–255. https://doi.org/10.21122/2220-9506-2022-13-4-247-255; Прибылов, Н. Н. Электрические потери в высокоомном кремнии с глубокими уровнями / Н. Н. Прибылов, Е. И. Прибылова // Физика и техника полупроводников. – 1996. – Т. 30, вып. 4. – С. 635–639.; Radiation effects in semiconductors / ed. K. Iniewski. – Boca Raton: CRC Press, 2011. – xvi + 416 p. https://doi.org/10.1201/9781315217864; Claeys, C. Radiation effects in advanced semiconductor materials and devices / C. Claeys, E. Simoen. – Berlin; Heidelberg: Springer, 2002. – xxii + 402 p. https://doi.org/10.1007/978-3-662-04974-7; Biosensors and bioelectronics / eds.: C. Karunakaran, K. Bhargava, R. Benjamin. – Amsterdam: Elsevier, 2015. – xii + 332 p. https://doi.org/10.1016/C2014-0-03790-2; Plonsey, R. Bioelectricity: a quantitative approach / R. Plonsey, R. C. Barr. – New York: Springer, 2007. – xiv + 528 p. https://doi.org/10.1007/978-0-387-48865-3; Bioelectronics: from theory to applications / eds.: I. Willner, E. Katz. – Weinheim: Wiley, 2005. – xviii + 476 p. https://doi.org/10.1002/352760376X; Rawlins, J. C. Basic AC circuits / J. C. Rawlins. – Boston: Newnes, 2000. – x + 542 p. https://doi.org/10.1016/B978-075067173-6/50006-7; Rahmani-Andebili, M. AC electrical circuit analysis: practice problems, methods, and solutions / M. RahmaniAndebili. – Cham: Springer, 2021. – x + 230 p. https://doi.org/10.1007/978-3-030-60986-3; Krupski, J. Interfacial capacitance / J. Krupski // Phys. Status Solidi B. – 1990. – Vol. 157, № 1. – P. 199–207. https://doi.org/10.1002/pssb.2221570119; Rahmani-Andebili, M. DC electrical circuit analysis: practice problems, methods, and solutions / M. RahmaniAndebili. – Cham: Springer, 2020. – x + 262 p. https://doi.org/10.1007/978-3-030-50711-4; Maddock, R. J. Electronics for engineers / R. J. Maddock, D. M. Calcutt. – Harlow: Longman, 1994. – xiv + 720 p.; Impedance spectroscopy: theory, experiment, and applications / eds.: E. Barsoukov, J. R. Macdonald. – Hoboken: Wiley, 2018. – xviii + 528 p. https://doi.org/10.1002/9781119381860; Tooley, M. Electronic circuits: fundamentals and applications / M. Tooley. – London: Routledge, 2020. – xii + 510 p. https://doi.org/10.1201/9780367822651; Pollak, M. Low-frequency conductivity due to hopping processes in silicon / M. Pollak, T. H. Geballe // Phys. Rev. – 1961. – Vol. 122, № 6. – P. 1742–1753. https://doi.org/10.1103/PhysRev.122.1742; Long, A. R. Frequency-dependent loss in amorphous semiconductors / A. R. Long // Adv. Phys. – 1982. – Vol. 31, № 5. – P. 553–637. https://doi.org/10.1080/00018738200101418; Castro, R. High-frequency conductivity of amorphous and crystalline Sb2Te3 thin films / R. Castro, A. Kononov, N. Anisimova // Coatings. – 2023. – Vol. 13, № 5. – P. 950 (1–10). https://doi.org/10.3390/coatings13050950; Elliott, S. R. A.c. conduction in amorphous chalcogenide and pnictide semiconductors / S. R. Elliott // Adv. Phys. – 1987. – Vol. 36, № 2. – P. 135–218. https://doi.org/10.1080/00018738700101971; Климкович, Б. В. Прыжковая электропроводность на переменном токе ковалентных полупроводников с глубокими дефектами / Б. В. Климкович, Н. А. Поклонский, В. Ф. Стельмах // Физика и техника полупроводников. – 1985. – Т. 19, вып. 5. – С. 848–852.; AC conductivity of undoped a-Si:H and µc-Si:H in connection with morphology and optical degradation / M. Yamazaki [et al.] // Jpn. J. Appl. Phys. – 1989. – Vol. 28, № 4R. – P. 577–585. https://doi.org/10.1143/JJAP.28.577; Chen, B. Development of thick film PECVD amorphous silicon with low stress for MEMS applications / B. Chen, F. E. H. Tay, C. Iliescu // Proc. SPIE. – 2008. – Vol. 7269. – P. 72690M (1–11). https://doi.org/10.1117/12.810441; https://vestifm.belnauka.by/jour/article/view/782

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    Academic Journal

    Contributors: This work was supported by the Belarusian National Research Program "Materials Science New Materials and Technologies" and Grant for Young Researchers by the Ministry of Education of the Republic of Belarus.

    Source: Devices and Methods of Measurements; Том 13, № 4 (2022); 247-255 ; Приборы и методы измерений; Том 13, № 4 (2022); 247-255 ; 2414-0473 ; 2220-9506 ; 10.21122/2220-9506-2022-13-4

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    Relation: https://pimi.bntu.by/jour/article/view/786/635; Poklonski N.A., Vyrko S.A. Nonlinear screening of the field of a dopant ion on the metal side of the Mott phase transition in semiconductors. Phys. Solid State, 2002, vol. 44, no. 7, pp. 1235-1240. DOI:10.1134/1.1494615; Monakhov A.M., Rogachev A.A. 0scillations of the electrostatic potential of semiconductors in the case of screening of an external electric field by nonequilibrium charge carriers. Sov. Phys. Solid State, 1988, vol. 30, no. 4, pp. 666-670.; Furgel' I.A., Shapiro M.M. Charge distribution and structure of inhomogeneous plasma confined by unlike-charge planes. J. Eng. Phys. Thermophys., 1993, vol. 64, no. 5, pp. 492-496. DOI:10.1007/BF00862642; Pribylov N.N., Pribylova E.I. Electrical losses in high-resistivity silicon with deep levels. Semiconductors, 1996, vol. 30, no. 4, pp. 344-346.; Poklonski N.A., Anikeev I.I., Vyrko S.A. Low-frequency admittance of capacitor with working substance "insulator-partially disordered semiconductor-insulator". Devices and Methods of Measurements, 2021, vol. 12, no. 3, pp. 202-210. DOI:10.21122/2220-9506-2021-12-3-202-210; Vostokov N.V., Shashkin V.I. Admittance and nonlinear capacitance of a multilayer metal-semiconductor structure. Semiconductors, 2008, vol. 42, no. 7, pp. 783-787. DOI:10.1134/S1063782608070063; Bondarenko V.B., Filimonov A.V. 0n a chaotic potential at the surface of a compensated semiconductor under conditions of the self-assembly of electrically active defects. Semiconductors, 2015, vol. 49, no. 9, pp. 1187-1190. DOI:10.1134/S1063782615090080; Bondarenko V.B., Filimonov A.V. Criterion for strong localization on a semiconductor surface in the Thomas-Fermi approximation. Semiconductors, 2017, vol. 51, no. 10, pp. 1321-1325. DOI:10.1134/S1063782617100062; Tsurikov D.E., Yafyasov A.M. Differential capacitance of a semiconductor film. Semiconductors, 2010, vol. 44, no. 10, pp. 1292-1296. DOI:10.1134/S106378261010009X; Kovalevskaya T.E., 0vsyuk V.N. 0n the potential distribution in a thin semiconductor layer. Semiconductors, 1996, vol. 30, no. 10, pp. 910-912.; Gubanov A.I., Davydov S.Yu. Calculation of contact potential for a thin semiconductor film. Sov. Phys. Semicond., 1971, vol. 5, no. 2, pp. 322-323.; Djurić Z., Smiljanić M. Static characteristics of metal-insulator-semiconductor-insulator-metal (MISIM) structures I. Electric field and potential distributions. Solid-State Electron. 1975, vol. 18, no. 10, pp. 817-825. DOI:10.1016/0038-1101(75)90001-5; Djurić Z., Smiljanić M., Tjapkin D. Static characteristics of the metal-insulator-semiconductor-insulatormetal (MISIM) structure II. Low frequency capacitance. Solid-State Electron., 1975, vol. 18, no. 10, pp. 827-831. DOI:10.1016/0038-1101(75)90002-7; Brazhe R.A. Electrodynamic convection of free charge carriers in semiconductors. Phys. Solid State, 1997, vol. 39, no. 2, pp. 245-247. DOI:10.1134/1.1130128; Maddock R.J., Calcutt D.M. Electronics for Engineers. Harlow, Longman, 1994, xiv+720 p.; Impedance Spectroscopy: Theory, Experiment, and Applications, ed. by E. Barsoukov, J.R. Macdonald. Hoboken, Wiley, 2018, xviii+528 p.; Tooley M. Electronic Circuits: Fundamentals and Applications. London, Routledge, 2020, XII+510 p.; Berman L.S., Klinger P.M., Fistul' V.I. Determination of the parameters of deep centers in an overcompensated semiconductor from the temperature dependence of the capacitance and active conductance. Sov. Phys. Semicond., 1989, vol. 23, no. 11, pp. 1206-1208.; Grundmann M. The Physics of Semiconductors. An Introduction Including Nanophysics and Applications. Cham, Springer, 2021, xxxviii+890 p. DOI:10.1007/978-3-030-51569-0; Poklonski N.A., Vyrko S.A., Podenok S.L. Statisticheskaya fizika poluprovodnikov [Statistical physics of semiconductors]. Moscow, KomKniga Publ., 2005, 264 p.; Blakemore J.S. Semiconductor Statistics. New York, Dover, 2002, xviii+382 p.; Shockley W. Electrons and Holes in Semiconductors: With Applications to Transistor Electronics. New York, R.E. Krieger Pub. Co., 1976, xxiv+558 p.; Marshak A.H. 0n the inappropriate use of the intrinsic level as a measure of the electrostatic potential in semiconductor devices. IEEE Electron Dev. lett., 1985, vol. 6, no. 3, pp. 128-129. DOI:10.1109/EDL.1985.26069; Adachi S. Properties of Group-IV, III-V and IIVI Semiconductors. Chichester, Wiley, 2005, xviii+388 p. DOI:10.1002/0470090340; Madelung 0. Semiconductors: Data Handbook Berlin, Springer, 2004, xiv+692 p. DOI:10.1007/978-3-642-18865-7; Handbook Series on Semiconductor Parameters. Vol. 1: Si, Ge, C (Diamond), GaAs, GaP, GaSb, InAs, InP, InSb, ed. by M. Levinshtein, S. Rumyantsev, M. Shur. Singapore, World Scientific, 1996, xiv+218 p. DOI:10.1142/2046-vol1; Couderc R., Armara M., Lemiti M. Reassessment of the intrinsic carrier density temperature dependence in crystalline silicon. J. Appl. Phys., 2014, vol. 115, no. 9, pp. 093705 (1-5). DOI:10.1063/1.4867776; Green M.A. Intrinsic concentration, effective densities of states, and effective mass in silicon. J. Appl. Phys., 1990, vol. 67, no. 6, pp. 2944-2954. DOI:10.1063/1.345414; Stepanov G.V., Shevchenko 0.F., Luk'yanov A.E., Mukailov N.S., Urazgil'din I.F., Krokhina E.A. Study of phenomena occurring upon electrical breakdown over the surface of silicon and in the interior of silicon dioxide. Bull. Acad Sci. USSR. Phys. Ser., 1982, vol. 46, no. 12, pp. 123-127.; Krause H. Trap induction and breakdown mechanism in Si02 films. Phys. Status Solidi A, 1985, vol. 89, no. 1, pp. 353-362. DOI:10.1002/pssa.2210890137; Chen I.C., Holland S.E., Hu C. Electrical breakdown in thin gate and tunneling oxides. IEEE Trans. Electron. Dev., 1985, vol. 32, no. 2, pp. 413-422. DOI:10.1109/T-ED.1985.21957; https://pimi.bntu.by/jour/article/view/786

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    Academic Journal

    Source: Electrical engineering & Electromechanics, Iss 1, Pp 17-20 (2018)
    Electrical Engineering & Electromechanics; № 1 (2018): Electrical Engineering & Electromechanics №1 2018; 17-20
    Электротехника и Электромеханика; № 1 (2018); 17-20
    Електротехніка і Електромеханіка; № 1 (2018): Електротехніка і Електромеханіка №1 2018; 17-20

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    Conference

    Contributors: Вавилова, Галина Васильевна

    Relation: Научная инициатива иностранных студентов и аспирантов российских вузов : сборник докладов IX Всероссийской научно-практической конференции, Томск, 24-26 апреля 2019 г. — Томск, 2019.; http://earchive.tpu.ru/handle/11683/56562

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    Conference

    Contributors: Вавилова, Галина Васильевна

    Relation: Ресурсоэффективные системы в управлении и контроле: взгляд в будущее : сборник научных трудов V Международной конференции школьников, студентов, аспирантов, молодых ученых, г. Томск. 3-8 октября 2016 г. Т. 3. — Томск, 2016.; http://earchive.tpu.ru/handle/11683/36562

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    Report

    Contributors: Нестеренко, Тамара Георгиевна

    File Description: application/pdf

    Relation: Хмелёв В. А. Разработка электродных структур микромеханических сенсоров : бакалаврская работа / В. А. Хмелёв; Национальный исследовательский Томский политехнический университет (ТПУ), Инженерная школа неразрушающего контроля и безопасности (ИШНКБ), Отделение электронной инженерии (ОЭИ); науч. рук. Т. Г. Нестеренко. — Томск, 2019.; http://earchive.tpu.ru/handle/11683/55069

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    Report

    Contributors: Гольдштейн, Александр Ефремович

    File Description: application/pdf

    Relation: Ермошин Н. И. Методы и средства контроля сопротивления изоляции кабельных изделий : научный доклад / Н. И. Ермошин; Национальный исследовательский Томский политехнический университет (ТПУ), Управление магистратуры, аспирантуры и докторантуры (УМАД), Отдел аспирантуры и докторантуры (ОАиД); науч. рук. А. Е. Гольдштейн. — Томск, 2019.; http://earchive.tpu.ru/handle/11683/53535

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    Academic Journal

    Relation: Saitarly, S., Plavan, V., Pushkarev, Yu., Manoilenko О., Dmytrenko I. (2017). Eastern-Regulation of properties of ebonite compositions and vulcanized anticorrosive coatings using a ftorlon filler. Eastern-European Journal of Enterprise Technologies, 3/6 (87), 29-35.; http://dspace.opu.ua/jspui/handle/123456789/5437

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